A method for manufacturing a thin film transistor (TFT) includes the steps
of: providing a substrate (1); and forming a TFT circuit on the substrate
using laser-induced chemical vapor deposition (LCVD). Detailedly, the
method includes providing the bare substrate, cleaning the substrate with
cleaning liquid, and successively forming a gate electrode (2), a gate
oxide layer (3), a source electrode (5), and a drain electrode (6) on the
substrate by LCVD, thus obtaining the thin film transistor. The forming
steps may be controlled by one or more computer programs. The LCVD can be
pyrolytic LCVD, photolytic LCVD, or photophysical LCVD. The method is
simple and inexpensive.