A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template (10) and the method of making comprises forming a transparent conductive layer (16) over a substrate (12). A SiCN layer (18) is formed over the transparent conductive layer (16), and a patterning layer (20) formed on the SiCN layer (18). The SiCN layer (18) is converted to an SiO.sub.2 layer by applying an O.sub.2 plasma (23). The SiO.sub.2 layer prevents damage to the transparent conductive layer (16) during cleaning and provides a binding mechanism for the imprint release coating.