There is provided an optical component. The optical component includes a material having a surface that heats to a maximum temperature (T.sub.max) when subjected to radiation. The material has a temperature-dependent coefficient of thermal expansion (.alpha.(T)) of about zero at a temperature T.sub.0 that is approximately equal to T.sub.max. The optical component is suitable for use in any of an illumination system, a projection objective or a projection exposure system, as employed, for example, for EUV microlithography.