Methods, and program storage devices, for performing model-based optical
lithography corrections by partitioning a cell array layout, having a
plurality of polygons thereon, into a plurality of cells covering the
layout. This layout is representative of a desired design data hierarchy.
A density map is then generated corresponding to interactions between the
polygons and plurality of cells, and then the densities within each cell
are convolved. An interaction map is formed using the convolved
densities, followed by truncating the interaction map to form a map of
truncated cells. Substantially identical groupings of the truncated cells
are then segregated respectively into differing ones of a plurality of
buckets, whereby each of these buckets comprise a single set of identical
groupings of truncated cells. A hierarchical arrangement is generated
using these buckets, and the desired design data hierarchy enforced using
the hierarchical arrangement to ultimately correct for optical
lithography.