The exposure apparatus includes: a light source which emits parallel light
having a wavelength used for exposure; a photomask which includes a
substrate, an optical shielding layer and an optical selective layer, the
substrate being capable of transmitting the light of the wavelength, the
optical shielding layer being made of a material not transmitting the
light of the wavelength, the optical selective layer selectively
transmitting light in accordance with a shape to be formed by the
exposure, the optical shielding layer and the optical selective layer
being arranged on a first side of the substrate; a photomask stage which
holds the photomask of which the first side has been coated with
photosensitive material, in such a manner that the light emitted from the
light source falls on a second side of the photomask reverse to the first
side and is projected to the photosensitive material on the first side; a
photomask rotation device which rotates the photomask stage on an axis
perpendicular to the second side of the photomask; and a photomask tilt
device which is capable of tilting the photomask held on the photomask
stage in such a manner that the light emitted from the light source falls
perpendicularly and obliquely on the second side of the photomask.