The present invention relates to a various systems for generating and
directing electron flow, and related methods, manufacturing techniques
and related componentry, such as can be used in lithography, microscopy
and other applications. In one embodiment, the present invention involves
a system that includes an electron source having a plurality of
independently-actuatable emission surfaces each of which is capable of
emitting electrons, and an optical column adjacent to the electron source
through which the emitted electrons pass. The optical column includes a
plurality of actuatable electrodes that are capable of influencing paths
taken by the emitted electrons.