Provided is a sputtering target material which has a high reflectance and
which is excellent in a sulfurization resistance, comprising an Ag alloy
prepared by alloying Ag with a specific small amount of the metal
component (A) selected from In, Sn and Zn, a specific small amount of the
metal component (B) selected from Au, Pd and Pt and, if necessary, a
small amount of Cu.