An exposure apparatus includes an alignment station where an alignment measurement process is executed, an exposure station where an exposure process is executed, and two stages, which can be swapped between the alignment station and the exposure station. A first blowing unit blows temperature-adjusted gas toward the alignment station, a second blowing unit blows temperature-adjusted gas toward the exposure station, and an air curtain unit forms an air curtain between the alignment station and the exposure station. The air curtain unit includes a third blowing unit which is arranged between the alignment station and the exposure station and blows gas so as to form an air curtain to partition the alignment station and the exposure station, and a third temperature adjusting unit supplies temperature-adjusted gas to the third blowing unit.