A semiconductor memory device and methods of manufacturing and operating the same may be provided. The semiconductor memory device may include a substrate, at least a pair of fins protruding from the semiconductor substrate and facing each other with a gap between fins of the pair of fins, an insulating layer formed between the pair of the fins, a storage node formed on the pair of fins and/or a surface of a portion of the insulating layer, and/or a gate electrode formed on the storage node.