A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material,wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5). M.sup.II.sub.vA.sub.xB.sub.yO.sub.zS.sub.w (1) 0.05.ltoreq.v/x.ltoreq.5 (2) 1.ltoreq.y/x.ltoreq.6 (3) 0.01.ltoreq.z/(z+w).ltoreq.0.85 (4) 0.6.ltoreq.(v+x+3y/2)/(z+w).ltoreq.1.5 (5)wherein M.sup.II represents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).