A resistance exercise apparatus comprises a frame, a guide mounted on the frame, a resistance support movable relative to the guide along a path; and a resistance assembly for applying a resistance during an exercise. The resistance assembly includes a first resister having a first resistance, and a second resister having a second resistance. The first resistance and the second resistance are selectively and independently applied by the first resister and the second resister during an exercise. The first resister and the second resister are each arranged substantially symmetrically relative to the path.