A patterning method comprises selectively depositing droplets of a first material solvent solution onto a layer of a second material. The solvent is chosen to dissolve both materials, which are selected so as to exhibit phase separation upon the removal of the solution to provide domains of the first material embedded in and extending through the second material. By selection of appropriate materials the patterning method may be used, for example, to fabricate light emitting devices, optical color filters, or vertical interconnects in electronic devices.