A semiconductor device comprises static random access memory (SRAM) cells
formed in a semiconductor substrate, first deep trenches isolating each
boundary of an n-well and a p-well of the SRAM cells, second deep
trenches isolating the SRAM cells into each unit bit cell, and at least
one or more contacts taking substance voltage potentials in regions
isolated by the first and second deep trenches. Then, the device becomes
possible to improve a soft error resistance without increasing the device
in size.