The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, ##STR00001## where, R' is selected independently from hydrogen, (C.sub.1-C.sub.4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, ##STR00002## where, W is a multivalent linking group, R.sub.1 to R.sub.6 are independently selected from hydrogen, hydroxyl, (C.sub.1-C.sub.20) alkyl and chlorine, X.sub.1 and X.sub.2 are independently oxygen or N--R.sub.7, where R.sub.7 is hydrogen or (C.sub.1-C.sub.20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.