The present invention relates to polycyclic polymers, methods for
producing polycyclic polymers, and methods for their use as photoresists
in the manufacture of integrated circuits. In one embodiment, the present
invention relates to photoresist compositions formed from the
polymerization of at least one halogenated polycyclic monomer or
hydrohalogenated polycyclic monomer. In another embodiment, the present
invention relates to photoresist compositions formed from the
co-polymerization of at least one halogenated polycyclic monomer or
hydrohalogenated polycyclic monomer with at least one non-halogenated
polycyclic monomer.