A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) ##STR00001## wherein, A represents .Iadd.sulfide group, disulfide group or .Iaddend.bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, .[.sulfide group, or disulfide group,.]. X represents nitrogen atom or C(NH.sub.2), and R.sup.1 and R.sup.2 independently represent hydrogen or alkyl.