Improved implant devices and methods for interspinous distraction distribute the load of interspinous distraction so that the entire load is not bearing on the interspinous surfaces. The implant device has a narrow midsection and two wider, flange-shaped outer sections. The wider, flange-shaped outer sections can be tightened to bear against the thicker bony portions of the spinous processes to support some of the load. Optionally, the wider, flange-shaped outer sections can be configured with pins that will penetrate and engage the thicker bony portions of the spinous processes, which will increase the load bearing potential of the wider, flange-shaped outer sections. Additionally, the wider, flange-shaped outer sections and the pins will help to stabilize the joint. The joint stabilization may help to prevent further dislocation of the vertebra that occurs with spondylolisthesis.