A synthesis for a silated acidic polymer by a copolymerization of several
monomers includes one acidic monomer and one silated monomer. The silated
acidic polymer is used as a resist barrier in imprint lithography and is
easily removed by an environmental basic aqua-solution during the
stripping process without using RIE (reactive ion etching) process or
organic solvent at the last step of resist stripping so that the
throughput is enhanced and good etching resistibility together with
cost-saving is obtained.