The present invention discloses a photocurable composition that is combinable with a thermally curable clearcoat composition to form a dual curable composition that is useful for forming clearcoats with improved sag resistance. The photocurable composition of the invention includes at least one photocurable oligomer; a first photoinitiator that absorbs light in a first spectral region such that curing of the photocurable composition preferentially occurs near the surface of the of the coating; and a second photoinitiator that absorbs light in a second spectral region such that curing of the photocurable composition occurs throughout the coating. The present invention also provides a method of coating a substrate with a dual curable composition.