An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to locally fill a space between the projection optical system and the substrate on the substrate stage with the liquid, and a recovery mechanism recovers the liquid. A plate is provided in at least a part of the periphery of a mounted area of the substrate on the substrate stage. The plate has a surface arranged at substantially the same height as a surface of the substrate mounted on the substrate stage.

 
Web www.patentalert.com

< Method for evaluating color picture tubes and device for the same and method for making color picture tubes

> Switching apparatus and method for varying an impedance of a phase line of a segment of an electrical power line

> Fluid user interface such as immersive multimediator or input/output device with one or more spray jets

~ 00570