The present invention is to provide a "fabricating method for quantum dot active layer of LED by nano-lithography" for fabricating out a new active layer of LED of nano quantum dot structure in more miniature manner than that of the current fabricating facilities to have high quality LED with features in longer light wavelength, brighter luminance and lower forward bias voltage by directly using the current fabricating facilities without any alteration or redesign of the precision.

 
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> Method for destruction of metallic carbon nanotubes, method for production of aggregate of semiconducting carbon nanotubes, method for production of thin film of semiconducting carbon nanotubes, method for destruction of semiconducting carbon nanotubes, method for production of aggregate of metallic carbon nanotubes, method for production of thin film of metallic carbon nanotubes, method for production of electronic device, method for production of aggregate of carbon nanotubes, method for selective reaction of semiconducting carbon nanotubes

> Self-constrained anisotropic germanium nanostructure from electroplating
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