A method for manufacturing an optical element having a surface-emitting type semiconductor laser and a photodetector element that detects light emitted from the surface-emitting type semiconductor laser, the method including the steps of: (a) laminating, above a substrate, semiconductor layers for forming a first mirror, an active layer, a second mirror, a photoabsorption layer, an etching stopper layer and a contact layer; (b) patterning the semiconductor layers to form at least a photoabsorption layer, an etching stopper layer and a contact layer; (c) forming an electrode above the contact layer; and (d) etching a portion of the contact layer until an upper surface of the etching stopper layer is exposed.

 
Web www.patentalert.com

< High speed data channel including a CMOS VCSEL driver and a high performance photodetector and CMOS photoreceiver

> Apparatus and methods for adjusting the rotational frequency of a scanning device

> Robustly stabilizing laser systems

~ 00577