A pattern forming apparatus maintaining alignment between a mold and a substrate. The pattern forming apparatus includes a press pressing the mold against the substrate in a pressing direction, and a mechanism to maintain orientation of the mold and the substrate perpendicular to the pressing direction.

 
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> Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method

> Structure capable of use for generation or detection of electromagnetic radiation, optical semiconductor device, and fabrication method of the structure
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