A processing block S2 includes unit blocks, a BCT layer B3, COT layer B4
and TCT layer B5, for forming coating films, and further includes DEV
layers B1, B2 layered with the unit blocks B3, B4, B5 and used as unit
blocks for a developing process. Beside the unit blocks B1 to B5, a group
G of transfer sections comprising transfer sections adapted to transfer
each wafer W with each main arm A1 to A5 of the unit block B1 to B5 and
hydrophobicity rendering units adapted to provide a hydrophobicity
rendering process to the wafer W is provided. The wafer W is transferred
by a transfer arm D between the transfer sections and the hydrophobicity
rendering units. In this case, since it is not necessary to transfer the
wafer W to the hydrophobicity rendering unit by using, for example, a
main arm A4 of a COT layer B4, the load on the arm A4 can be reduced,
thereby enhancing the carrying throughput.