According to one exemplary embodiment, an extreme ultraviolet (EUV) source
collector module for use in a lithographic tool comprises an EUV debris
mitigation filter. The EUV debris mitigation filter can be in the form of
an aerogel film, and can be used in combination with an EUV debris
mitigation module comprising a combination of conventional debris
mitigation techniques. The EUV debris mitigation filter protects
collector optics from contamination by undesirable debris produced during
EUV light emission, while advantageously providing a high level of EUV
light transmittance. One disclosed embodiment comprises implementation of
an EUV debris mitigation filter in an EUV source collector module
utilizing a discharge-produced plasma (DPP) light source. One disclosed
embodiment comprises implementation of an EUV debris mitigation filter in
an EUV source collector module utilizing a laser-produced plasma (LPP)
light source.