An exposure apparatus including an illumination optical system to
illuminate an original with exposure light of plural wavelengths, a
projection optical system to project an image of a pattern of the
original onto a substrate, an original-side reference pattern provided at
an original side of the projection optical system, a substrate-side
reference pattern provided at a substrate side of the projection optical
system, and an image plane detecting system configured so that the
original-side reference pattern is illuminated with the exposure light or
light equivalent to the exposure light with respect to a wavelength
component rate.