A n-type layer, a multiquantum well active layer comprising a plurality of
pairs of an InGaN well layer/InGaN barrier layer, and a p-type layer are
laminated on a substrate to provide a nitride semiconductor light
emitting element. A composition of the InGaN barrier included in the
multiquantum well active layer is expressed by In.sub.xGa.sub.1-xN
(0.04.ltoreq.x.ltoreq.0.1), and a total thickness of InGaN layers
comprising an In composition ratio within a range of 0.04 to 0.1 in the
light emitting element including the InGaN barrier layers is not greater
than 60 nm.