An apparatus, system, and method are disclosed for fabricating a patterned media imprint master. A substrate and a deposition mask may be fixably attached by an intervening spacing element, such that the substrate and deposition mask act as a unified element during a deposition process. A deposition mask may include a plurality of apertures generated by a conventional lithographic process. Material may be deposited onto the substrate through the deposition mask from more than one deposition source oriented at a unique deposition angle. A resulting substrate deposition pattern thus exhibits a density greater than a deposition mask aperture density while avoiding deposition pattern distortion.