An optical property measurement apparatus is equipped with an optical
system unit that selectively places an opening section for passing
illumination light, a microlens array for measuring wavefront aberration,
and a polarization detection system for measuring a polarization state of
the illumination light on an optical path of the illumination light.
Accordingly an illumination shape and a size of an illumination optical
system, wavefront aberration of a projection optical system and a
polarization state of the illumination light can be measured together.
Therefore, for example, even when exposure is performed with polarized
illumination that is a type of modified illumination, highly-accurate
exposure can be achieved by adjusting various optical systems based on
the measurement results.