A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.

 
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< Inter facial architecture for nanostructured optoelectronic devices

> Light emitting device provided with semiconducting phosphor configured with four fluorescences having different emission peak wavelengths

> Scaffold-organized clusters and electronic devices made using such clusters
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