The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y.sub.3Al.sub.5O.sub.12, Lu.sub.3Al.sub.5O.sub.12, Ca.sub.3Al.sub.2Si.sub.3O.sub.12, K.sub.2NaAlF.sub.6, K.sub.2NaScF.sub.6, K.sub.2LiAlF.sub.6 and/or Na.sub.3Al.sub.2Li.sub.3F.sub.12, (Mg, Zn)Al.sub.2O.sub.4, CaAl.sub.2O.sub.4, CaB.sub.2O.sub.4 and/or LiAl.sub.5O.sub.8, BaZrO.sub.3 and/or CaCeO.sub.3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.