The present invention relates to a capacitive measurement method and system for a nanoimprint process, which arranges a plurality of electrode plates on both the backside of the master mold and the surface of the supporting base carrying the wafer substrate to form a plurality of capacitive structures. By monitoring the capacitance variation signal caused by the continuous variations in the thickness and the material properties of the resist during the imprint process, the status of the resist can be monitored and recorded, which is used as the references for determining the timing to demold in the nanoimprint process and for maintaining the flatness of the resist. Accordingly, the nanoimprint process can be automated easier and the quality and the throughput of of the nanometer scaled imprint product can be improved.