A semiconductor device and a fabricating method thereof are provided. A PMD layer and at least one IMD layer are formed on a semiconductor substrate. A through-electrode penetrates through the PMD layer and the IMD layer, and a connecting electrode connects to the through-electrode.

 
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> Intermetallic diffusion block device and method of manufacture

> Method for inspecting magnetic characteristics of a plurality of thin magnetic heads by means of local application of magnetic field
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