An exposure head, includes: a first imaging optical system and a second imaging optical system which are arranged in a first direction; a light emitting element which emits light to be imaged by the first imaging optical system; and a light emitting element which emits light to be imaged by the second imaging optical system, wherein an inter-optical-system distance in the first direction between the first imaging optical system and the second imaging optical system satisfies the following expression: m1L1+m2L2>2P1-(m1dp1+m2dp2) where m1 represents an absolute value of the optical magnification of the first imaging optical system, L1 represents a width in the first direction of the light emitting element to be imaged by the first imaging optical system, dp1 represents a pitch between the light emitting element in the first direction in the light emitting element to be imaged by the first imaging optical system, m2 represents an absolute value of the optical magnification of the second imaging optical system, L2 represents a width in the first direction of the light emitting element to be imaged by the second imaging optical system, and dp2 represents a pitch between the light emitting element in the first direction in the light emitting element to be imaged by the second imaging optical system.