A system and method for optically monitoring contamination of machinery includes an optical illumination source, a photodetector and an analysis module. The system and method can monitor a fuser roll, a fuser belt, or other printer module component. The optical illumination source can emit at least one illuminating frequency. The at least one illuminating frequency is configured to cause a contaminant marker to fluoresce at least one fluorescing frequency and is also configured to at least partially illuminate the machine component. The machine component contains the contaminant marker when at least partially contaminated. The photodetector is responsive to the at least one fluorescing frequency and detects the at least one fluorescing frequency emitted from the contaminated machine component. The analysis module is in operative communication with the photodetector and is figured to receive a signal therefrom. The analysis module is configured to estimate contamination of the machine component as a function of the signal from the photodetector.