A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R.sup.1, R.sup.3, R.sup.4, R.sup.7, R.sup.9, and R.sup.11 are H or CH.sub.3, Y is methylene or O, R.sup.2 is CO.sub.2R.sup.10 when Y is methylene and R.sup.2 is H or CO.sub.2R.sup.10 when Y is O, R.sup.10 is C.sub.1-C.sub.15 alkyl which may be separated by O, R.sup.5 and R.sup.6 are H or OH, R.sup.8 is a tertiary ester type acid-labile protective group, and R.sup.12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias. ##STR00001##