A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.

 
Web www.patentalert.com

< Methods, systems, and computer program products for grid-morphing techniques in placement, floorplanning, and legalization

< Design and layout of phase shifting photolithographic masks

> Method and apparatus to determine if a pattern is robustly manufacturable

> Packet filtering in a NIC to control antidote loading

~ 00615