An exposure apparatus for measuring a position of a stage, configured to hold a substrate, using a laser interferometer, and exposing the substrate through an original, and an optical element opposite to the substrate with a gap between the optical element and the substrate filled with liquid. A first supply nozzle is arranged around the optical element, which supplies the liquid to the gap, a first recovery nozzle arranged around the first supply nozzle recovers the liquid from the gap, a second supply nozzle supplies a gas outside the first recovery nozzle, a controller controls an amount of the liquid supplied from the first supply nozzle and an amount of the liquid and gas recovered from the first recovery nozzle, and a wall portion is arranged around the optical element and substantially parallel to a surface of the substrate. If Q1 is the amount of the liquid supplied from the first supply nozzle and Q2 is a sum of the amount of the liquid and gas recovered from the first recovery nozzle, a relationship Q1