Calibration wafers and methods for calibrating a plasma process performed in a plasma processing apparatus, such as an ionized physical vapor deposition apparatus. The calibration wafer includes one or more selective-redeposition sources that may be used for calibrating a plasma process. The selective-redeposition sources are constructed to promote the redeposition of a controllable and/or measurable amount of material during the plasma process.

 
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> Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

> Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall

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