Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group

   
   

A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: ##STR1## wherein R.sub.1 is a hydrogen atom or alkyl group, R.sub.2 is an acid-labile group, X is a hydrogen atom, or substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstitued alkyl group or alicyclic hydrocarbon group having 1 to 20 carbon atoms.

Un monomère photosensible comprenant un dérivé de butyrolactone de méthylène représenté par la formule suivante : ## du ## STR1 où R.sub.1 est un atome d'hydrogène ou un groupe alcoyle, R.sub.2 est un groupe acide-labile, X est un atome d'hydrogène, ou groupe alcoyle substitué ou non substitué ayant 1 à 10 atomes de carbone, et Y est substituée ou unsubstitued le groupe alcoyle ou le groupe alicyclique d'hydrocarbure ayant 1 à 20 atomes de carbone.

 
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