Semiconductor device with SI-GE layer-containing low resistance, tunable contact

   
   

The present invention provides a semiconductor device in which a low resistance, tunable contact is formed by means of using a Si.sub.x Ge.sub.1-x (0 Присытствыющий вымысел обеспечивает прибора на полупроводниках в низкое сопротивление, tunable контакт сформировано посредством использования Si.sub.x Ge.sub.1-x (0

 
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