Apparatus for analyzing multi-layer thin film stacks on semiconductors

   
   

An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.

 
Web www.patentalert.com

< Measuring plate

< System and method for generating a profile of particulate components of a body fluid sample

> Measuring surface roughness to calculate filler dispersion in a polymer sample

> Method and apparatus for adjusting illumination angle

~ 00125