A photosensitive polymer of a resist composition includes a copolymer of
alkyl vinyl ether containing silicon and maleic anhydride, represented by
the following formula:
##STR1##
where R.sub.1 is --H, --OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3 or
--OSi(CH.sub.3).sub.3 ; R.sub.2 is --H, --OH, --OCOCH.sub.3,
--OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3 or --OSi(CH(CH.sub.3).sub.2).sub.3
; R.sub.3 is --H, --OH or --OCOCH.sub.3 ; R.sub.4 is --H,
--OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3, --CH.sub.2 OSi(CH.sub.3).sub.2
C(CH.sub.3).sub.3 or --CH.sub.2 OSi(CH(CH.sub.3).sub.2).sub.3 ; and at
least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is a Si-containing
group.
