A lithographic projection apparatus includes a first object table
configured and arranged to hold a patterning structure capable of
patterning a projection beam of radiation according to a desired pattern
and a second object table configured and arranged to hold a substrate. A
positioning structure is configured and arranged to generate a force so as
to move one of the object tables with respect to a projection system
during an imaging operation. Processing circuitry is configured and
arranged to read from a data storage device a compensation force value
that corresponds to a value of a signal representing a position of said
object table and to generate a force adjustment signal based on the
compensation force value. The positioning structure is further configured
and arranged to generate the force according to the force adjustment
signal.
