Polymers and photoresist compositions for short wavelength imaging

   
   

The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.

La présente invention inclut les polymères et les compositions polyacetal en vernis photosensible qui incluent les polymères comme composant de reliure de résine. Les vernis photosensibles de l'invention incluent l'positif-action chimique-amplifiée résiste qui peut être efficacement reflètente aux longueurs d'onde courtes telles que sub-300 nm, en particulier à 157 nm.

 
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