In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit
by unit successively on a surface of a substrate, and a
high-refractive-index transparent thin film is deposited on a surface of
the laminate of the n thin-film units, each of the n thin-film units
consisting of a high-refractive-index thin film and a silver transparent
conductive thin film. When the silver transparent conductive thin films
are deposited by a vacuum dry process, the temperature T(K) of the
transparent substrate at the time of film deposition is set to be in a
range 340.ltoreq.T.ltoreq.410, whereby the transparent laminate having a
standard deviation of visible light transmittance which is not larger than
5% in a wave range of from 450 to 650 nm can be produced.