The subject invention relates to broadband optical metrology tools for
performing measurements of patterned thin films on semiconductor
integrated circuits. Particularly a family of optical designs for
broadband, multi-wavelength, DUV-IR (185<.lambda.<900 nm)
all-refractive optical systems. The designs have net focusing power and
this is achieved by combining at least one positively powered optical
element with one negatively powered optical element. The designs have
small spot-size over the wavelength range spanning 185-900 nm with
substantially reduced spherical aberration, axial color, sphero-chromatism
and zonal spherical aberration. The refractive optical systems are broadly
applicable to a large class of broadband optical wafer metrology tools
including spectrophotometers, spectroscopic reflectometers, spectroscopic
ellipsometers and spectroscopic scatterometers.
Η υπαγόμενη εφεύρεση αφορά τα ευρυζωνικά οπτικά εργαλεία μετρολογίας για τις μετρήσεις των διαμορφωμένων λεπτών ταινιών στα ολοκληρωμένα κυκλώματα ημιαγωγών. Ιδιαίτερα μια οικογένεια των οπτικών σχεδίων για την ευρεία ζώνη, πολυ-μήκος κύματος, δuβ-IR (185
