An exposure apparatus which has a light source and transfers a pattern of
an original to a substrate using light supplied from the light source
includes a photoelectric sensor used to control an amount of light to
which the substrate is exposed, a memory storing a first value for
correcting an output value of the photoelectric sensor with respect to
each accumulated energy of light, having a first power, with which the
photoelectric sensor is irradiated, a calculator which calculates a second
value for correcting an output value of the photoelectric sensor
corresponding to a second accumulated energy of light, having a second
power, with which the photoelectric sensor is irradiated, based on the
first value in the memory corresponding to the second accumulated energy,
and a ratio of the second power to the first power, and a correction unit
which corrects an output value of said photoelectric sensor using the
second value.
