Method of manufacturing TFT array
   
   

In the halftone region of a photomask, uniformity in thickness of the photoresist is enhanced. The halftone region of the photomask is arranged such that a transmitting portion and a shielding portion are alternately provided to form a transmitting/shielding pattern. The transmitting portion at the end of the transmitting/shielding pattern has a larger area than the other transmitting portion.

 
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