Method of forming a ferroelectric film by direct annealing of the ferroelectric film using laser or lamp followed by a second annealing through a light transmission and/or absorption film

   
   

In a method of forming a ferroelectric film according to the present invention, pulsed laser light or pulsed lamp light is applied to an amorphous oxide film formed over a substrate to form microcrystalline nuclei of oxide in the oxide film. A light transmission and/or absorption film is formed over the oxide film. Crystallization of the oxide is performed by applying pulsed laser light or pulsed lamp light from above the light transmission and/or absorption film to form a ferroelectric film.

 
Web www.patentalert.com

< Sheet-form layered structure with attractive appearance and utilization thereof

< Method of manufacturing TFT array

> Electrical circuit board and TFT array substrate and liquid crystal display device utilizing the same

> Liquid crystal display device, image shifting device, and image display apparatus

~ 00177